EN 6786 High Phosphorus Electroless Nickel Plating with Fast Deposition Rate Non-Magnetic Semi-Bright to Bright Coatings
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Hervorheben
Fast Deposition Rate Electroless Nickel Plating
,Non-Magnetic High Phosphorus Nickel Plating
,Semi-Bright to Bright Coatings EN 6786
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VerwendenChemisches Nickel
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TypElektroless Nickelplattierung mit hohem Phosphorgehalt
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Phosphorgehalt10 - 14% (Wt)
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HerkunftsortCHINA
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MarkennameFENGFAN
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ModellnummerEinheitliche Prüfungen
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Min BestellmengeVerhandelbar
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PreisVerhandelbar
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Verpackung InformationenStandard -Exportverpackung
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Lieferzeit15-25 Arbeitstage
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ZahlungsbedingungenL/C, D/A, D/P, T/T, Western Union, MoneyGram
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Versorgungsmaterial-Fähigkeit200000pcs/Tag
EN 6786 High Phosphorus Electroless Nickel Plating with Fast Deposition Rate Non-Magnetic Semi-Bright to Bright Coatings
EN 6786 High Phosphorus Electroless Nickel Plating
EN 6786 High-phosphorus Electroless Nickel Plating is a new type of electroless nickel-phosphorus alloy plating process. This process exhibits excellent stability with a high phosphorus content ranging from 10 to 14 (wt.%), and a maximum deposition rate of 10-18 micrometers per hour. EN 6786 provides semi-bright to bright coatings with outstanding corrosion resistance that meets MIL.SPEC.26074D and AMS.2404B standards.
I. Coating Characteristics
- Magnetism: Non-magnetic
- Phosphorus content (wt%): 10 - 14
- Coating density (g/cm³): 7.1 - 7.9
- Melting point (°C): 860 - 950
- Electrical resistivity (μΩ•cm): 40 - 100
- Hardness (HV): 500 - 600
- Hardness after heat treatment (HV, 400°C for 1 hour): 900 - 1000
- Neutral salt spray test (ASTM B117): Above 1000 hours at 35°C, 5% NaCl
- Nitric acid test (68% concentrated nitric acid, room temperature): No color change after 1 minute or more
II. Process Characteristics
- Fast deposition rate: 10-18 μm/h
- High phosphorus content, non-magnetic coating with excellent corrosion resistance and ductility
- Excellent stability with a lifespan of over 8 cycles
- Low coating porosity, no porosity up to 15 μm, strong corrosion resistance
- Wide range of bath loading: 0.2-2 dm²/L
III. Preparation of Plating Solution
| Composition and operating conditions | Process Parameters |
|---|---|
| EN 6786 A | 60 ml |
| EN 6786 B | 180 ml |
| pH | 4.2 - 5.0, adjusting pH with ammonia water |
| Temperature | 85 - 90 ℃ |
| Working load capacity | 0.2-2 dm²/L |
| Agitation or stirring | Air agitation for filtration |
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